Adhesion Aspects Of Thin Films by Kash L. Mittal

April 3, 2017 | Physical Chemistry | By admin | 0 Comments

By Kash L. Mittal

A moment foreign symposium on adhesion features of skinny movies, held in Orlando, Florida in December 2003, extended from the 1st through contemplating metalized plastics and adhesion size. The 17 papers that caught to the publishing technique transparent to the tip examine such issues as adhesion houses of functionally gradient diamond- like carbon nano-composite movies, characterizing polyethylene-metal composite skinny motion pictures deposited by means of evaporation, the contribution of chemical reactions among aluminum atoms and kinds of sensible teams to the adhesion of aluminum-polymer platforms, and severe occasions saw on copper movies on glass substrate within the micro-scratch attempt. there isn't any index. VSP is a subsidiary of Brill.

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Zhang and H. Xie, Surf: Coating. Technol. 113, 120-125 (1999). 17. R. J. Hill, Physical Vapor Deposition, Temescal, Berkeley, CA (1986). 18. Y. Catherine, Diamond and Diamond-like Films and Coatings, Plenum Press, New York, NY (1991). 19. S. Zhang, X. T. Zeng, H. Xie and P. Hing, Surf: Coating. Technol. 123, 256-260 (2000). 20. A. Grill, Wear 168, 143-153 (1993). 21. B. K. Tay, Y. H. Cheng, X. Z. Ding, S. P. Lau, X. Shi, G. F. You and D. Sheeja, Diamond Relat. Mater. 10, 1082-1087 (2001). 22. S.

Keywords: Vapor deposition; polyethylene; aluminum; gold; composite layers. 1. INTRODUCTION Polymer thin films, such as polyethylene (PE), have been deposited by vacuum evaporation since the 1970s and their crystallinity, chemical structure and molecular weight have been characterized [l, 21. Pogrion and Tirnovan [3] analyzed the structure of the PE thin films before and after irradiation with electron beams using transmission electron microscopy and electron diffraction. In addition, polymer thin films have been deposited by the ionization-assisted deposition (IAD) method and their chemical structure, molecular weight and crystallinity have been characterized [4].

INTRODUCTION Hydrogen-free (or non-hydrogenated) amorphous carbon (a-C) has found many engineering applications for more than two decades [ 1 , 21. Various techniques have been used to deposit a-C coatings on Si wafers, steels or tungsten carbide tools. These techniques include magnetron sputtering [3], pulsed laser deposition [4], cathodic vacuum arc deposition [ 5 ] , etc. The applications of an a-C coating strongly depend on its adhesion to the substrate. Adhesion strength dictates the ability of a coating to remain attached to the substrate under operating conditions.

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